ACS OMEGA, cilt.10, sa.7, ss.6567-6577, 2025 (SCI-Expanded, Scopus)
This study investigates the CdTe thin films prepared using two distinct methods: classical and cryogenic techniques of thermal evaporation within a substrate temperature range of 100-573 K. X-ray diffraction (XRD) analysis revealed cubic (111) crystal growth across all substrate temperatures, transitioning to an amorphous structure as the temperature approached 100 K. The CdTe thin film produced at 200 K stood out with superior structural properties, characterized by the lowest surface roughness (R a = 1.1 nm) and a highly uniform grain structure, attributed to the soliton growth mechanism. The grain sizes of the thin films decreased from 53.6 to 14.8 nm with a decreasing substrate temperature, correlating with an increase in resistivity (1.88-3.87 x 103 Omega