Effect Of Thickness Of Double Layer TiO2/Al2O3 Antireflection Coating On Crystal Silicon Solar Cell

Bayazıt T., Kanmaz İ.

EGE 12th INTERNATIONAL CONFERENCE ON APPLIED SCIENCES, İzmir, Türkiye, 26 - 30 Aralık 2024, ss.1-2

  • Yayın Türü: Bildiri / Özet Bildiri
  • Basıldığı Şehir: İzmir
  • Basıldığı Ülke: Türkiye
  • Sayfa Sayıları: ss.1-2
  • Recep Tayyip Erdoğan Üniversitesi Adresli: Evet

Özet

ABSTRACT

In this study, the reflectance values ​​were calculated for single layer Al2O3, TiO2 and double layer Al2O3/TiO2 configurations using Fresnel equations and Transfer Matrix Method (TMM). By applying different thickness in the range 30-100 nm for each thin film, reflection-wavelenght values in the range of 300-1100 nm were obtained. The lowest average reflection values ​​of 14.20% and 13.31% were obtained for single layer TiO2 (60 nm) and Al2O3 (80 nm), respectively.  The lowest average reflection value for double layer AL2O3/TiO2 was recorded as 9.18%. After thickness optimization, the parameters of solar cell for crystalline silicon solar cells was investigated using the SCAPS program. The efficiency values ​​of crystalline silicon solar cells were calculated as 19.72%, 19.93%, and 20.90% for single layer TiO2, Al2O3 and double layer Al2O3/TiO2 antireflection coatings, respectively.

 

Keywords: Antireflection Coating, Al2O3, TiO2, Thin Film, SCAPS